@Article{ Braun.Burstedde.Kunoth:2005,
author = {J. Braun and C. Burstedde and A. Kunoth},
title = {Computing Light Masks in Neutral Atom Lithography},
journal = {Journal of Computational Physics},
volume = {220},
number = {1},
pages = {422--440},
year = {2006},
annote = {article,physik},
pdf = {http://wissrech.ins.uni-bonn.de/research/pub/braun/brppaper_preprint.pdf}
,
abstract = {In neutral atom lithography, a collimated beam of atoms is
sent through a region of standing light waves created by
interfering laser beams. The intensity distribution of the
light field modulates the density distribution of the atoms
transversal to the beam direction. The atomic beam
materializes on a substrate, and the atoms are deposited in
a pattern which mimics the intensity distribution of the
light. It is thus possible to create nanostructures by a
suitable adjustment of the light field. While the
computation of the pattern of atoms generated by any given
setup of laser beams with known amplitudes and phases is
straightforward, the inverse problem of deducting the
appropriate amplitude and phase of each single beam to
create a prescribed pattern has to our knowledge not yet
been addressed.
We propose a numerical method to derive these values for a
fixed setup of laser beams.We consider first the general
case of unrelated beam directions and then specialize to
setups which induce periodic patterns. The solution of the
inverse problem is a two-step process: We use Fourier
techniques to compute a set of characteristic amplitude
values which enter the right hand side of a nonlinear
system of equations. This system is then solved iteratively
by a coordinate descent method.}
}